The Gas Injection System (GIS) is a fundamental component of FIB-SEM instrumentation, providing two key functions: material deposition and assisted etching.
The Dalex-100 GIS supplies precursor gases including Pt, W, and C for protective deposition during cross-sectioning and TEM sample preparation, as well as Pt, W, and SiO₂ for circuit repair applications. It also enables XeF₂-assisted silicon etching to enhance cutting rates.
In addition, the system supports a range of specialised precursor gases for targeted milling and gas-assisted dry etching of specific materials.
