MC-4 Multi-Functional Cleaner
The MC-4 is a versatile, high-performance cleaning solution that integrates three advanced decontamination technologies into a single, modular platform. Designed for the precision cleaning of SEM, FIB, and TEM samples, it provides a flexible workflow for the most demanding microscopy applications.
High-Density Plasma Cleaning (ICP)
- Precision UV Decontamination
- Heated Vacuum Desorption
Product Details
Core Features & Smart Integration
- Triple-Action Decontamination: Switch instantly between Downstream Plasma, UV Irradiation, and Heated Vacuum Desorption to suit specific sample requirements.
- Universal Microscope Compatibility: Engineered for SEM, FIB, and TEM systems. Includes a dedicated port for TEM specimen rod adapters for a seamless workflow.
- Smart Control & Remote Access: Features an intuitive 9-inch touchscreen and Wi-Fi connectivity for full remote operation and monitoring from anywhere in the lab.
- Dual-Purpose Vacuum Storage: Functions as a constant-temperature vacuum storage cabinet, protecting sensitive samples from oxidation and contamination.
- Specialized TEM Support: Custom-designed ports for TEM rod adapters and a customizable rod pump storage function to keep hardware organized and under vacuum.
Advanced Application Modes
1. High-Density Plasma Cleaning (ICP)
- Technology: Utilizing Inductively Coupled Plasma (ICP) to generate a particle density significantly higher than traditional capacitive systems.
- The "Downstream" Advantage: Specialized geometry prevents ion bombardment, ensuring zero damage to delicate surface morphology.
- Efficiency: High concentrations of oxygen radicals efficiently strip away stubborn hydrocarbon contaminants.
- Proven Results: Successfully restores clarity to Gold Particle Standards by removing carbon deposits in scan areas.
2. Precision UV Decontamination
- Technology: Employs a dual-wavelength UV system (185 nm and 254 nm) for high-efficiency photochemical cleaning.
- Mechanism: UV irradiation generates active ozone and oxygen radicals; hydrocarbons decompose into volatile species and are continuously evacuated.
- Proven Results: Optimized for Silicon Wafer processing; effectively eliminates "halo" carbon buildup.
3. Heated Vacuum Desorption
- Mechanism: Rapid chamber heating (up to 150°C) accelerates the desorption of adsorbed moisture and organic species.
- Dual-Vacuum Modes: Configurable for Low Vacuum (10-2 Torr) or High Vacuum (10-5 Torr) based on outgassing needs.
- Thermal Stability: High-precision PID control maintains stability within ±1°C.
Installation & Maintenance
- Standard Mounting: Equipped with a KF 40 quick connector for fast, tool-free installation on microscope chambers or vacuum vessels.
- Vacuum Integrity: Operates safely while the microscope's turbo pump is active, ensuring no loss of chamber vacuum.
- Simplified Upkeep: Modular design engineered for long-term reliability with no specialized maintenance required
