High-Density Plasma Generation Utilizing Inductively Coupled Plasma (ICP) technology, this system produces a significantly higher particle density than traditional capacitively coupled methods for more thorough cleaning.
Effective Hydrocarbon Removal High concentrations of oxygen radicals quickly and effectively strip away surface hydrocarbon contaminants, ensuring pristine sample surfaces.
Non-Destructive "Downstream" Cleaning Our specialized downstream approach eliminates ion bombardment, preserving the original surface properties and ensuring zero damage to delicate samples.
High-Vacuum Compatibility Engineered for electron microscopy, the system operates between 0.01–500 Pa, allowing for cleaning without compromising the chamber’s high vacuum or requiring the turbo pump to be powered down.
Intuitive One-Touch Control Simplify your workflow with user-friendly software featuring one-button operation and a library of optimized cleaning recipes.
